The call for applications for the HISK programme 2017 and 2018 is closed.
The deadline submission for the HISK programme 2018 and 2019 is 15 June 2017 (postmark & online submission).
If you want to stay informed on the call for applications and the HISK events, please write to firstname.lastname@example.org.
All applicants have to
1. Fill in the online application form in English (the application form will be available in the course of the year)
2. Send the following to HISK, Charles de Kerchovelaan 187a, 9000 Gent, Belgium
- - a beamer presentation with recent work (incl. titles and information): PowerPoint or pdf / landscape format / max. 25 pages / max. 65 MB.
- each image must be accompanied by a description, max. 5 lines long, with the following info:
- additional contextualisation
- (in addition to your basic presentation which counts max. 25 pages, you are free to add an extra presentation, with more works)
- - if you make films/videos, provide videos as a DVD with a menu or as Quicktime films. Please provide short excerpts of max. 3 minutes of videos longer than 6 minutes.
- + include the videos in the beamer presentation: 1 page per video containing a screenshot, title, date, length and a short description.
- - a general work description in English (max. 1300 characters)
- - a motivation of the application in English (max. 1300 characters)
- - a detailed curriculum vitae in English including a list of exhibitions, grants, scholarships, awards, commissions, etc.
- - a recent passport photograph
- - a scan of ID card or passport
- - a scan of undergraduate and/or graduate diploma
- - a printout of the beamer presentation (in color)
- - a printout of the detailed curriculum vitae including a list of exhibitions, grants, scholarships, awards, commissions, etc.
- - (optional) catalogues and texts describing your artistic work
- - (optional) letter(s) of recommendation. The letter of recommendation have to be signed.
Deadline submission: 15 June 2017 (postmark & online submission).
An international jury will make a selection in July 2017.
Applicants who have not been selected can collect their documents at the HISK administration office upon the conclusion of the admission procedure. Documentation of selected candidates will be archived in the HISK records. HISK makes every effort to handle the submitted documentation with the utmost care, but can however not be held responsible for any loss or damage.
The admission committee is composed of international visiting lecturers from a variety of backgrounds. The committee makes a pre-selection from the submitted portfolios; the selected candidates are subsequently invited for an interview on their motivations and expectations. After a period of evaluation and careful deliberation, the committee decides upon the admission of the applicant.
Artists who have already obtained a Master's degree in Fine Art or an equivalent qualification are eligible to apply to the HISK. Exceptions can be made for applicants who do not have a Master's degree but whose artistic trajectory evidences a high level of development, motivation and artistic affinity.
The conceptual and visual qualities of the works submitted by the applicants are considered more important than their style, utilised material or technique. Participants are expected to show a strong commitment to conducting critical research within their respective fields of interest. At the same time, they should aim to situate their practice within a broader social and cultural context. Candidates are also expected to contribute in or to the activities of the HISK as a whole. This interaction is seen as an important forum of exchange and development.
The postgraduate educational programme of the HISK is a two-year, full-time programme, which starts on 1 January 2018 and ends on 31 December 2019.
13 artists will be admitted.
The registration fee amounts to 2000 Euros per year + a one-time deposit of 300 Euros. Health insurance is not included in the registration fee. The registration fee and the deposit are to be paid before the start of the working year.
The Higher Institute of Fine Arts offers a private workspace and pedagogical guidance. There are no scholarships or residencies available. HISK does not provide housing. Living expenses are to be entirely covered by the participating artist.
Foreign participating artists are required to obtain a student visa and an official residence permit. The participating artists themselves are responsible for all the necessary administration pertaining thereto. Participating artists who come from abroad are expected to reside in Gent during the two years HISK programme.